Use of UO sub 2 films for electrochemical studies

• Published in: Journal of nuclear materials Vol. 298; no. 3; pp. 280 - 290
• Main Authors: Miserque, F, Gouder, T, Wegen, D H, Bottomley, P D W
• Format: Journal Article
• Language: English
• Published: 01-10-2001
• ISSN: 0022-3115

UO sub 2 films have been prepared by dc reactive sputtering of a uranium metal target in an Ar/O sub 2 atmosphere. We have used the films deposited on gold substrates as working electrodes for electrochemical investigations as simulating the surfaces of fuel pellets. Film composition was determined by photoelectron spectroscopy (XPS and UPS) and X-ray diffraction (XRD). The oxide stoichiometry as a function of deposition conditions was determined and the appropriate conditions for UO sub 2.0 formation established. AC impedance and cyclic voltammetry measurements were performed. A double RC electrical equivalent circuit was used to fit the data from impedance measurements, similar to those used in unirradiated UO sub 2 or spent fuel pellets. However due to the porosity or adhesion defects on the thin films that permitted a direct contact between the solution and the gold substrate, we were obliged to add a contribution simulating the water--gold system. Cyclic voltammetry measurements show the influence of pH on the dissolution mechanism. Alkaline solutions permit the formation of an oxidised layer (UO sub 2.33 ) which is not present in the acidic solutions. In both pH=2 and pH=6 solutions, a U exp VI species layer is formed.