The use of atomic hydrogen for low temperature oxide removel from HgCdTe

The use of atomic hydrogen for low temperature oxide removel from HgCdTe

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Bibliographic Details
Published in:Journal of electronic materials Vol. 27; no. 6; p. 651
Main Authors: Hirsch, L S, Ziemer, K S, Richards-Babb, M R, Stinespring, C D
Format: Journal Article
Language:English
Published: Warrendale Springer Nature B.V 01-06-1998
Online Access:Get full text
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ISSN:0361-5235
1543-186X