Two-dimensional model of a large area, inductively coupled, retangular plasma source for chemical vapor deposition

A novel design for an inductively coupled, rectangular plasma source is described.

Bibliographic Details

Published in:	IEEE transactions on plasma science Vol. 27; no. 5; p. 1317
Main Authors:	Giuliani, John L, Shamamian, Vasgen A, Thomas, Raymond E, Apruzese, John P
Format:	Journal Article
Language:	English
Published:	New York The Institute of Electrical and Electronics Engineers, Inc. (IEEE) 01-10-1999
Subjects:	Chemicals Diamonds Electromagnetism Plasma
Online Access:	Get full text
Tags:	Add Tag No Tags, Be the first to tag this record!