Simultaneous measurement of six layers in a silicon on insulator film stack using visible-near-IR spectrophotometry and single-wavelength beam profile reflectometry

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Bibliographic Details
Published in:	Thin solid films Vol. 313-14; pp. 270 - 275
Main Authors:	LENG, J. M, SIDOROWICH, J. J, SENKO, M, OPSAL, J
Format:	Conference Proceeding
Language:	English
Published:	Lausanne Elsevier Science 1998
Subjects:	Applied sciences Electronics Exact sciences and technology Microelectronic fabrication (materials and surfaces technology) Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices Near infrared radiation Silicon on insulator technology Microelectronic fabrication Multiple layer Reflectometry Measurement method Spectrophotometry Layer thickness Optimization
Online Access:	Get full text
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ISSN:	0040-6090 1879-2731