Roughness reduction in submicron waveguides by low-molecular weight development: Phoremost special issue on advances in nanophotonics

Roughness reduction in submicron waveguides by low-molecular weight development Phoremost special issue on advances in nanophotonics

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Bibliographic Details
Published in:Photonics and nanostructures Vol. 5; no. 2-3; pp. 145 - 148
Main Authors: UBALDI, M. C, STASI, V, COLOMBO, U, PICCININ, D, MARTINELLI, M
Format: Journal Article
Language:English
Published: New York Elsevier 2007
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Subjects:
Exact sciences and technology
Fundamental areas of phenomenology (including applications)
Optical elements, devices, and systems
Optical waveguides and coupleurs
Optics
Physics
Atomic force microscopy
Scanning electron microscopy
Nanophotonics
Hydroxides
Developers
Roughness
Roughness reduction; Line edge roughness; Waveguide; Resist development; Molecular aggregates
47.85.md; 82.35.-x; M 81.07.-b
Aggregate
Optical waveguides
Online Access:Get full text
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ISSN:1569-4410
1569-4429