Demonstration of MP18-26nm Ru Semi-Damascene Spacer-is-Dielectric SADP Integration

This work presents a novel Spacer-is-Dielectric (SID) SADP Ru semi-damascene integration scheme by using metal-based core and gap hard masks. More than 70% yield in tested line resistance and line-to-line leakage, especially in MP18 structures, confirm the flow feasibility. The tested MP18 structure...

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Bibliographic Details
Published in:	Proceedings of the IEEE International Interconnect Technology Conference pp. 1 - 3
Main Authors:	Wu, Chen, Decoster, Stefan, Renaud, Vincent, Hermans, Yannick, Marien, Philippe, Marti, Giulio, Heylen, Nancy, Kenens, Bart, Roy, Syamashree, Okudur, Fulya Ulu, Le, Quoc Toan, Reddy, Naveen, Marquez, Alfonso Sepulveda, Delie, Gilles, Gupta, Anshul, Lesniewska, Alicja, Murdoch, Gayle, Park, Seongho, Tokei, Zsolt
Format:	Conference Proceeding
Language:	English
Published:	IEEE 03-06-2024
Subjects:	Resistance Ru semi-damascene SADP Spacer-is-dielectric
Online Access:	Get full text
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Summary:	This work presents a novel Spacer-is-Dielectric (SID) SADP Ru semi-damascene integration scheme by using metal-based core and gap hard masks. More than 70% yield in tested line resistance and line-to-line leakage, especially in MP18 structures, confirm the flow feasibility. The tested MP18 structures show a median line resistance of 720Ω/μm, low line-to-line leakage at 1V, and breakdown voltages in the range of 12-14V.
ISSN:	2380-6338
DOI:	10.1109/IITC61274.2024.10732062