Anchoring of sulfur-containing alkylphosphonic and semifluorinated alkylphosphonicmolecules on a polycrystalline aluminum substrate

Self-assembly on a polycrystalline aluminum substrate of two sulfur-containing alkylphosphonic acids, CH3 –(CH2)11–S– (CH2)2 –PO(OH)2, and CF3 –(CF2)7 –(CH2)2 –S–(CH2)2 –PO(OH)2, has been compared with CH3 –(CH2)15 –PO(OH)2. The reaction of the phosphonic head groups with the hydroxyls at the alumin...

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Bibliographic Details
Published in:	Surface and interface analysis Vol. 40; pp. 85 - 96
Main Authors:	Fonder, G., Delhalle, J., Ameduri, Bruno, Essahli, Mohamed, Mekhalif, Zineb
Format:	Journal Article
Language:	English
Published:	Wiley-Blackwell 2008
Subjects:	Analytical chemistry Chemical Sciences Material chemistry Polymers sulfur-containing alkylphosphonic acids electrochemicalpolarization curves self-assembledmonolayers PM-IRRAS XPS aluminum
Online Access:	Get full text
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Summary:	Self-assembly on a polycrystalline aluminum substrate of two sulfur-containing alkylphosphonic acids, CH3 –(CH2)11–S– (CH2)2 –PO(OH)2, and CF3 –(CF2)7 –(CH2)2 –S–(CH2)2 –PO(OH)2, has been compared with CH3 –(CH2)15 –PO(OH)2. The reaction of the phosphonic head groups with the hydroxyls at the alumina surface to form phosphonates was studied with X-ray photoelectron spectroscopy (XPS) andpolarizationmodulation infrared reflection-absorption spectroscopy (PM-IRRAS).Barrier effects of the resulting layerswas assessed by electrochemical polarization curves.With the conditions used in the present work for the self-assembly reaction, it appears that the sulfur-containingmolecules do not perform as well as CH3 –(CH2)15 –PO(OH)2 in terms of film quality. Questions are raised about the possibility that the sulfur-containingmolecules could undergo cleavage during surfacemodification.
ISSN:	0142-2421 1096-9918
DOI:	10.1002/sia.2762