Ferroelectricity Improvement in Ultra‐Thin Hf 0.5 Zr 0.5 O 2 Capacitors by the Insertion of a Ti Interfacial Layer

Ferroelectricity Improvement in Ultra‐Thin Hf 0.5 Zr 0.5 O 2 Capacitors by the Insertion of a Ti Interfacial Layer

Saved in:
Bibliographic Details
Published in:Physica status solidi. PSS-RRL. Rapid research letters Vol. 16; no. 10
Main Authors: Segantini, Greta, Barhoumi, Rabei, Manchon, Benoît, Cañero Infante, Ingrid, Rojo Romeo, Pedro, Bugnet, Matthieu, Baboux, Nicolas, Nirantar, Shruti, Deleruyelle, Damien, Sriram, Sharath, Vilquin, Bertrand
Format: Journal Article
Language:English
Published: 01-10-2022
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
ISSN:1862-6254
1862-6270
DOI:10.1002/pssr.202270019