Thin SiCx layers prepared by hybrid laser–magnetron deposition

• Published in: Applied physics. A, Materials science & processing Vol. 93; no. 3
• Main Authors: Jelinek, Miroslav, Kocourek, Tomas, Zemek, Josef, Novotný, Michal, Kadlec, Jaromír
• Format: Journal Article
• Language: English
• Published: Berlin/Heidelberg Springer-Verlag 01-11-2008
• Subjects: Characterization and Evaluation of Materials; Condensed Matter Physics; Machines; Manufacturing; Nanotechnology; Optical and Electronic Materials; Physics; Physics and Astronomy; Processes; Surfaces and Interfaces; Thin Films; 81.05.Uw; 81.15.Fg; 81.16.Mk
• ISSN: 0947-8396; 1432-0630
• DOI: 10.1007/s00339-008-4727-4

Thin SiC
x
films were fabricated by hybrid laser–magnetron deposition system. KrF excimer laser was used for deposition of carbon and magnetron at the same time for sputtering of Si species. Films were fabricated in argon/hydrogen ambient with and without additional RF discharge. The substrate temperature was changed up to 700°C. Films topology, crystallinity, composition, chemical bonds and optical emission spectra were studied. Films were smooth and amorphous. Films of thickness 400–1000 nm were fabricated. Adhesion moved from 8 to 14 N, depending on deposition conditions.