Effect of the Si wafer pretreatment on the patterned substrate morphology and growth of Hg1-xCdxTe PLD films

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Bibliographic Details
Published in:	Materials science & engineering. B, Solid-state materials for advanced technology Vol. 71; no. 1-3; pp. 288 - 291
Main Authors:	GORBACH, T. Ya, HOLINEY, R. Yu, MATVEEVA, L. A, SVECHNIKOV, S. V, VENGER, E. F, KUZMA, M, WISZ, G
Format:	Conference Proceeding
Language:	English
Published:	Amsterdam Elsevier 14-02-2000
Subjects:	Cross-disciplinary physics: materials science; rheology Exact sciences and technology Laser deposition Materials science Methods of deposition of films and coatings; film growth and epitaxy Physics Patterning Inorganic compounds Ternary compounds Transition element compounds Pulsed laser deposition Crystallinity Electroreflectance Experimental study Substrates Film growth Surface structure Cadmium tellurides Mercury tellurides SEM Pretreatment Electronography
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ISSN:	0921-5107 1873-4944
DOI:	10.1016/S0921-5107(99)00392-X