Tuned Transport Path of Perovskite MAPbI3-based Memristor Structure

In this study, the features of resistive random access memory (RRAM) employing a straightforward Cr/MAPbI3/FTO three-layer structure have been examined and clarified. The device displays various resistance switching (RS) behavior at various sweep voltages between 0.5 and 5 V. The RS effect has a con...

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Published in:Chemphyschem Vol. 24; no. 18; p. e202300210
Main Authors: Doan, Uyen Tu Thi, Le, Duy Khanh, Huynh, Truong Lam, Ngo, Tung Thanh, Vo, Trieu Quang, Thi, Minh Thu Tran, Pham, Anh Tuan Thanh, Tran, Vinh Cao, Nguyen, Phuong Tuyet, Pham, Kim Ngoc
Format: Journal Article
Language:English
Published: Germany Wiley Subscription Services, Inc 15-09-2023
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Summary:In this study, the features of resistive random access memory (RRAM) employing a straightforward Cr/MAPbI3/FTO three-layer structure have been examined and clarified. The device displays various resistance switching (RS) behavior at various sweep voltages between 0.5 and 5 V. The RS effect has a conversion in the direction of the SET and RESET processes during sweeping for a number of cycles at a specific voltage.  The directional change of the RS processes corresponds to the dominant transition between the generation/recombination of iodide ion and vacancy in the MAPbI3 perovskite layer and the electrochemical metallization of the Cr electrode under the influence of an electric field, which results in the conductive filament (CF) formation/rupture. At each stage, these processes are controlled by specific charge conduction mechanisms, including Ohmic conduction, space-charge-limited conduction (SCLC), and variable-range hopping (VRH). By identifying the biased voltage and the quantity of voltage sweep cycles, one can take a new approach to control or modulate the pathways for effective charge transport. This new approach is made possible by an understanding of the RS characteristics and the corresponding mechanisms causing the variation of RS behavior in the structure.
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ISSN:1439-4235
1439-7641
DOI:10.1002/cphc.202300210