Double hollow cathode plasma jet-low temperature method for the TiO2―xNx photoresponding films

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Bibliographic Details
Published in:	Electrochimica acta Vol. 55; no. 5; pp. 1548 - 1556
Main Authors:	KMENT, S, KLUSON, P, HUBICKA, Z, KRYSA, J, CADA, M, GREGORA, I, DEYNEKA, A, REMES, Z, ZABOVA, H, JASTRABIK, L
Format:	Journal Article
Language:	English
Published:	Kidlington Elsevier 01-02-2010
Subjects:	Applied sciences Chemistry Electrochemistry Energy Exact sciences and technology General and physical chemistry Natural energy Photoelectrochemistry. Electrochemiluminescence Photovoltaic conversion Solar cells. Photoelectrochemical cells Solar energy Hollow cathode Composite film Titanium IV Oxides Polyimide Atomic force microscopy X ray Nitrogen addition N-doped titanium dioxide Surface structure Electrodes Cold plasma Amperometry Photoelectron spectrometry Raman spectrometry Thin layers Modified material Scanning electron microscopy Indium tin oxide electrode Plasma jet Doped materials IPCE Quartz Photocurrent Morphology Sputter deposition Photoelectric current Photovoltaic conversion
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ISSN:	0013-4686 1873-3859
DOI:	10.1016/j.electacta.2009.10.017