Highly Optimized Nanocrystal-Based Split Gate Flash for High Performance and Low Power Microcontroller Applications
We show a 90nm nanocrystal-based split gate embedded flash memory that is able to meet the speed, endurance and reliability requirements for 32-bit microcontroller products. A 3.4V operating window is achievable and the process is robust and repeatable across many lots. Erase after 10k cycles can be...
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Published in: | 2011 3rd IEEE International Memory Workshop (IMW) pp. 1 - 4 |
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Main Authors: | , , , , , , , , , , , , , , , , , , , , , , |
Format: | Conference Proceeding |
Language: | English |
Published: |
IEEE
01-05-2011
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Subjects: | |
Online Access: | Get full text |
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Summary: | We show a 90nm nanocrystal-based split gate embedded flash memory that is able to meet the speed, endurance and reliability requirements for 32-bit microcontroller products. A 3.4V operating window is achievable and the process is robust and repeatable across many lots. Erase after 10k cycles can be achieved in 5ms, long-term data retention of cycled arrays is not susceptible to SILC-induced charge loss mechanisms, and program disturb can meet the needs of flash and EEPROM. |
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ISBN: | 1457702258 9781457702259 |
ISSN: | 2159-483X |
DOI: | 10.1109/IMW.2011.5873213 |