An innovated JFET structure to adjust the pinch-off voltage by using a control gate
A novel N-JFET structure, combined with an innovative control gate between the uniform P-top and source is proposed. Control gate has a heavily doped P-type and a gap to uniform P-top. Pinch-off voltage of the JFET device can be easily adjusted by the size of the gap, while the breakdown voltage can...
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Published in: | 2017 International Conference on Electron Devices and Solid-State Circuits (EDSSC) pp. 1 - 2 |
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Main Authors: | , , |
Format: | Conference Proceeding |
Language: | English |
Published: |
IEEE
01-10-2017
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Subjects: | |
Online Access: | Get full text |
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Summary: | A novel N-JFET structure, combined with an innovative control gate between the uniform P-top and source is proposed. Control gate has a heavily doped P-type and a gap to uniform P-top. Pinch-off voltage of the JFET device can be easily adjusted by the size of the gap, while the breakdown voltage can be kept in the range of 700V ~ 800V. Rather than using 3D simulation which is more time consuming, this experiment uses 2D simulation for optimization and design. |
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DOI: | 10.1109/EDSSC.2017.8126551 |