An improvement of low temperature characteristics of an La-doped Pb(Zr,Ti)O3 capacitor

We developed a lanthanum-doped Pb(Zr0.4,Ti0.6)O3 (PLZT)-based ferroelectric capacitor (FE) aiming at low-voltage operation of ferroelectric random access memory at low temperatures down to −45 °C. High-temperature sputter-deposited IrOx (1 < x < 2) or HT-IrOx was employed as a top electrode (T...

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Bibliographic Details
Published in:Japanese Journal of Applied Physics Vol. 61; no. SN; p. SN1013
Main Authors: Wang, Wensheng, Eshita, Takashi, Takai, Kazuaki, Nomura, Kenji, Yamaguchi, Hideshi, Nakamura, Ko, Ozawa, Soichiro, Nagai, Kouichi, Watanabe, Junichi, Mihara, Satoru, Hikosaka, Yukinobu, Saito, Hitoshi, Kojima, Manabu
Format: Journal Article
Language:English
Published: Tokyo IOP Publishing 01-11-2022
Japanese Journal of Applied Physics
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Summary:We developed a lanthanum-doped Pb(Zr0.4,Ti0.6)O3 (PLZT)-based ferroelectric capacitor (FE) aiming at low-voltage operation of ferroelectric random access memory at low temperatures down to −45 °C. High-temperature sputter-deposited IrOx (1 < x < 2) or HT-IrOx was employed as a top electrode (TE) instead of room-temperature (RT) deposited IrOx or RT-IrOx over two PLZT stacked layers. We observed that polarization characteristics drastically improved even at −45 °C by employing HT-IrOx and thinning PLZT, even though leakage current was increased by about one order of magnitude. Transmission electron microscopy observations showed that HT-IrOx has a columnar-like crystalline structure while RT-IrOx has a granular-like crystalline structure. Secondary ion mass spectroscopy indicated that Pb diffusion from PLZT into TE was suppressed by HT-IrOx, which is considered to cause the improvement of polarization characteristics.
Bibliography:JJAP-S1102900.R1
ISSN:0021-4922
1347-4065
DOI:10.35848/1347-4065/ac7f7b