An improvement of low temperature characteristics of an La-doped Pb(Zr,Ti)O3 capacitor
We developed a lanthanum-doped Pb(Zr0.4,Ti0.6)O3 (PLZT)-based ferroelectric capacitor (FE) aiming at low-voltage operation of ferroelectric random access memory at low temperatures down to −45 °C. High-temperature sputter-deposited IrOx (1 < x < 2) or HT-IrOx was employed as a top electrode (T...
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Published in: | Japanese Journal of Applied Physics Vol. 61; no. SN; p. SN1013 |
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Main Authors: | , , , , , , , , , , , , |
Format: | Journal Article |
Language: | English |
Published: |
Tokyo
IOP Publishing
01-11-2022
Japanese Journal of Applied Physics |
Subjects: | |
Online Access: | Get full text |
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Summary: | We developed a lanthanum-doped Pb(Zr0.4,Ti0.6)O3 (PLZT)-based ferroelectric capacitor (FE) aiming at low-voltage operation of ferroelectric random access memory at low temperatures down to −45 °C. High-temperature sputter-deposited IrOx (1 < x < 2) or HT-IrOx was employed as a top electrode (TE) instead of room-temperature (RT) deposited IrOx or RT-IrOx over two PLZT stacked layers. We observed that polarization characteristics drastically improved even at −45 °C by employing HT-IrOx and thinning PLZT, even though leakage current was increased by about one order of magnitude. Transmission electron microscopy observations showed that HT-IrOx has a columnar-like crystalline structure while RT-IrOx has a granular-like crystalline structure. Secondary ion mass spectroscopy indicated that Pb diffusion from PLZT into TE was suppressed by HT-IrOx, which is considered to cause the improvement of polarization characteristics. |
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Bibliography: | JJAP-S1102900.R1 |
ISSN: | 0021-4922 1347-4065 |
DOI: | 10.35848/1347-4065/ac7f7b |