Ferroelectricity of nondoped thin HfO2 films in TiN/HfO2/TiN stacks

We report on the impact of TiN interfaces on the ferroelectricity of nondoped HfO2. Ferroelectric properties of nondoped HfO2 in TiN/HfO2/TiN stacks are shown in capacitance-voltage and polarization-voltage characteristics. The Curie temperature is also estimated to be around 500 °C. The ferroelectr...

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Bibliographic Details
Published in:	Japanese Journal of Applied Physics Vol. 55; no. 8S2
Main Authors:	Nishimura, Tomonori, Xu, Lun, Shibayama, Shigehisa, Yajima, Takeaki, Migita, Shinji, Toriumi, Akira
Format:	Journal Article
Language:	English
Published:	The Japan Society of Applied Physics 06-06-2016
Online Access:	Get full text
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Summary:	We report on the impact of TiN interfaces on the ferroelectricity of nondoped HfO2. Ferroelectric properties of nondoped HfO2 in TiN/HfO2/TiN stacks are shown in capacitance-voltage and polarization-voltage characteristics. The Curie temperature is also estimated to be around 500 °C. The ferroelectricity of nondoped HfO2 clearly appears by thinning HfO2 film down to ∼35 nm. We directly revealed in thermal treatments that the ferroelectric HfO2 film on TiN was maintained by covering the top surface of HfO2 with TiN, while it was followed by a phase transition to the paraelectric phase in the case of the open surface of HfO2. Thus, it is concluded that the ferroelectricity in nondoped HfO2 in this study was mainly driven by both of top and bottom TiN interfaces.
ISSN:	0021-4922 1347-4065
DOI:	10.7567/JJAP.55.08PB01