Bias Temperature Stress Instability of Multilayered MoS2 Field-Effect Transistors With CYTOP Passivation
Bias temperature stress instability on multilayered MoS 2 FETs was systematically investigated with the device scheme encapsulated with amorphous fluoropolymers [cyclized transparent optical polymer (CYTOP)] for the secure of minimization of external gas ambient effects. Large threshold voltage shif...
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Published in: | IEEE transactions on electron devices Vol. 66; no. 5; pp. 2208 - 2213 |
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Main Authors: | , |
Format: | Journal Article |
Language: | English |
Published: |
New York
IEEE
01-05-2019
The Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
Subjects: | |
Online Access: | Get full text |
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Summary: | Bias temperature stress instability on multilayered MoS 2 FETs was systematically investigated with the device scheme encapsulated with amorphous fluoropolymers [cyclized transparent optical polymer (CYTOP)] for the secure of minimization of external gas ambient effects. Large threshold voltage shifts (<inline-formula> <tex-math notation="LaTeX">\Delta {V}_{\textsf {th}} </tex-math></inline-formula>) for the negative bias temperature stress (NBTS) were observed, compared to the positive bias temperature stress (PBTS). Herein, the asymmetry behaviors on <inline-formula> <tex-math notation="LaTeX">\Delta {V}_{\textsf {th}} </tex-math></inline-formula>, observed in this paper, are ascribed to the sulfur vacancy in MoS 2 layers, leading to large hole traps compared to electron traps in MoS 2 layers. Moreover, high-temperature-sensitivity [<inline-formula> <tex-math notation="LaTeX">{d} </tex-math></inline-formula>(<inline-formula> <tex-math notation="LaTeX">\Delta {V}_{\textsf {th}} </tex-math></inline-formula>)/ dT ] on <inline-formula> <tex-math notation="LaTeX">\Delta {V}_{\textsf {th}} </tex-math></inline-formula> for PBTS than NBTS was observed, and their origins are possibly due to synergetic effects associated with large trap energy distribution (<inline-formula> <tex-math notation="LaTeX">{k}_{o}{T} </tex-math></inline-formula>) for electron trap levels. |
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ISSN: | 0018-9383 1557-9646 |
DOI: | 10.1109/TED.2019.2904338 |