Sensitivity to NH3 of SnO2 thin films prepared by magnetron sputtering

Sensitivity to NH3 of SnO2 thin films prepared by magnetron sputtering

SnO 2 thin film sensor was fabricated with microelectronic technology and NH 3 (ammonia) gas sensing characteristics were measured in a temperature range 200-375degC. It was observed that surface doping with platinum improves significantly the material's sensitivity to ammonia, and the optimal...

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Bibliographic Details
Published in:2009 International Siberian Conference on Control and Communications pp. 189 - 193
Main Authors: Anisimov, O.V., Maksimova, N.K., Chernikov, E.V., Sevastyanov, E.Y., Sergeychenko, N.V.
Format: Conference Proceeding
Language:English
Published: IEEE 01-03-2009
Subjects:
Chemical sensors
Communication system control
Gas sensors
Microelectronics
Plasma measurements
sensing properties
Sensor phenomena and characterization
Sputtering
Substrates
Temperature measurement
Temperature sensors
Thin film sensors
thin films
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Summary:SnO 2 thin film sensor was fabricated with microelectronic technology and NH 3 (ammonia) gas sensing characteristics were measured in a temperature range 200-375degC. It was observed that surface doping with platinum improves significantly the material's sensitivity to ammonia, and the optimal operational temperature of the sensor was 325degC. The sensor showed high sensitivity to low NH 3 concentration in the range 20-350 ppm with relatively fast response (10 s) and recovery times (30 s), respectively.
ISBN:1424420075
9781424420070
DOI:10.1109/SIBCON.2009.5044854