Air-bridge contact fabrication for in-plane active photonic crystal devices

Air-bridge contact fabrication for in-plane active photonic crystal devices

The fabrication of air-bridge contacts for in-plane active photonic crystal devices is presented. The technology allows to access waveguides as narrow as 200 nm. The main fabrication challenges described in detail are surface planarization and formation of isolation layers for contact pads. The issu...

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Bibliographic Details
Published in:2010 22nd International Conference on Indium Phosphide and Related Materials (IPRM) pp. 1 - 4
Main Authors: Kaspar, P, Kappeler, R, Friedli, P, Jaeckel, H
Format: Conference Proceeding
Language:English
Published: IEEE 01-05-2010
Subjects:
Contacts
Etching
Indium phosphide
Optical device fabrication
Optical surface waves
Optical waveguides
Photonic crystals
Planarization
Semiconductor materials
Silicon
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Description
Summary:The fabrication of air-bridge contacts for in-plane active photonic crystal devices is presented. The technology allows to access waveguides as narrow as 200 nm. The main fabrication challenges described in detail are surface planarization and formation of isolation layers for contact pads. The issue of surface damage effects on dry-etched sidewalls is addressed and current measurements on narrow contacts were performed.
ISBN:9781424459193
1424459192
ISSN:1092-8669
DOI:10.1109/ICIPRM.2010.5516124