24.3 A 200-to-350GHz SiGe BiCMOS Frequency Doubler with Slotline-Based Mode-Decoupling Harmonic-Tuning Technique Achieving 1.1-to-4.7dBm Output Power
Silicon-based ultra-broadband terahertz (THz) generation has attracted growing interest in recent years, as it provides a low-cost and high-integration solution for high-resolution radar, hyperspectral imaging, and rotational spectroscopy systems [1]. However, direct THz-signal generation with an ex...
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Published in: | 2023 IEEE International Solid- State Circuits Conference (ISSCC) pp. 23 - 25 |
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Main Authors: | , , , |
Format: | Conference Proceeding |
Language: | English |
Published: |
IEEE
19-02-2023
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Subjects: | |
Online Access: | Get full text |
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Summary: | Silicon-based ultra-broadband terahertz (THz) generation has attracted growing interest in recent years, as it provides a low-cost and high-integration solution for high-resolution radar, hyperspectral imaging, and rotational spectroscopy systems [1]. However, direct THz-signal generation with an extensive bandwidth and high output power (\mathsf{P}_{\mathsf{out}}) remains challenging due to the degraded tuning range of varactors and the limited \mathsf{f}_{\mathsf{T}}/\mathsf{f}_{\mathsf{max}} of transistors. A practical alternative is frequency multiplication, which depends on the nonlinearity of devices and extracts the output high-order harmonics, thereby extending the bandwidth of the input signal. Prior broadband THz-frequency multipliers, whether employing distributed architecture or not, were merely based on the broadband input fundamental and output harmonic matching [1-5]. Part of them have considered the input high-order harmonics, but simply added harmonic reflectors to improve \mathsf{P}_{\mathsf{out}} and efficiency at the cost of bandwidth reduction [2]. However, any neglect or underuse of the high-order harmonics leaked or generated at the input of the nonlinear device limits the THz-frequency multiplication performance, especially the \mathsf{P}_{\mathsf{out}} bandwidth. |
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ISSN: | 2376-8606 |
DOI: | 10.1109/ISSCC42615.2023.10067586 |