Electrochemically deposited thin films of amorphous Fe–P alloy: Part I. Chemical composition and phase structure characterization

Thin Fe–P alloy films (0.5 to 25.0 μm thick) were electrodeposited from sulfate solutions. The influences of various deposition conditions (current density, time, pH and temperature) on the composition and structure of the deposited films were examined. These Fe–P films were first characterized by t...

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Bibliographic Details
Published in:Journal of electroanalytical chemistry (Lausanne, Switzerland) Vol. 448; no. 2; pp. 245 - 252
Main Authors: ZECEVIC, S. K, ZOTOVIC, J. B, GOJKOVIC, S. L, RADMILOVIC, V
Format: Journal Article
Language:English
Published: Amsterdam Elsevier B.V 20-05-1998
Elsevier Science
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Summary:Thin Fe–P alloy films (0.5 to 25.0 μm thick) were electrodeposited from sulfate solutions. The influences of various deposition conditions (current density, time, pH and temperature) on the composition and structure of the deposited films were examined. These Fe–P films were first characterized by the ALSV. The voltammograms obtained show several current peaks, indicating the presence of several different phase structures in the deposit. Chemical composition of the phase structures in the film was determined by EDX analysis and the amorphous nature of the alloy was verified by XRD and DTA techniques. Chemical and phase structure compositions of the alloys (containing 15–50 at.% P in the form of phosphides FeP, Fe 2P and/or Fe 3P) were found to depend on deposition conditions. Appearance and morphology of the film alloys were also found to depend on deposition conditions, particularly current density, as illustrated by the SEM technique.
ISSN:1572-6657
1873-2569
DOI:10.1016/S0022-0728(97)00417-8