An Atomic Force Microscope Study of Surface Roughness of Thin Silicon Films Deposited on $hbox SiO_2

An Atomic Force Microscope Study of Surface Roughness of Thin Silicon Films Deposited on $hbox SiO_2

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Bibliographic Details
Published in:IEEE transactions on nanotechnology Vol. 4; no. 3; pp. 303 - 311
Main Authors: Nasrullah, J., Tyler, G.L., Nishi, Y.
Format: Journal Article
Language:English
Published: 01-05-2005
Online Access:Get full text
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Description
ISSN:1536-125X
DOI:10.1109/TNANO.2005.847007