Atomic Layer Deposition: Effect of Various Oxidants on Reaction Mechanisms, Self‐Limiting Natures and Structural Characteristics of Al 2 O 3 Films Grown by Atomic Layer Deposition (Adv. Mater. Interfaces 14/2018)

Atomic Layer Deposition: Effect of Various Oxidants on Reaction Mechanisms, Self‐Limiting Natures and Structural Characteristics of Al 2 O 3 Films Grown by Atomic Layer Deposition (Adv. Mater. Interfaces 14/2018)

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Bibliographic Details
Published in:Advanced materials interfaces Vol. 5; no. 14
Main Authors: Wang, Haoran, Liu, Yunfei, Liu, Hui, Chen, Zheng, Xiong, Pengpeng, Xu, Xiangchen, Chen, Fangyi, Li, Kun, Duan, Yu
Format: Journal Article
Language:English
Published: 01-07-2018
Online Access:Get full text
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ISSN:2196-7350
2196-7350
DOI:10.1002/admi.201870070