Droplet Controlled Growth Dynamics in Molecular Beam Epitaxy of Nitride Semiconductors

• Published in: Scientific reports Vol. 8; no. 1; pp. 11278 - 8
• Main Authors: Azadmand, Mani, Barabani, Luca, Bietti, Sergio, Chrastina, Daniel, Bonera, Emiliano, Acciarri, Maurizio, Fedorov, Alexey, Tsukamoto, Shiro, Nötzel, Richard, Sanguinetti, Stefano
• Format: Journal Article
• Language: English
• Published: London Nature Publishing Group UK 26-07-2018; Nature Publishing Group
• Subjects: 639/301/1019/1020/1089; 639/301/119/1000; 639/301/299/946; Epitaxy; Growth rate; Humanities and Social Sciences; Low temperature; Molecular beam epitaxy; multidisciplinary; Science; Science (multidisciplinary); Semiconductors
• ISSN: 2045-2322; 2045-2322
• DOI: 10.1038/s41598-018-28984-9

The growth dynamics of Ga(In)N semiconductors by Plasma-Assisted Molecular Beam Epitaxy (PAMBE) at low temperatures (
T
 = 450 °C) is here investigated. The presence of droplets at the growth surface strongly affects the adatom incorporation dynamics, making the growth rate a decreasing function of the metal flux impinging on the surface. We explain this phenomenon via a model that considers droplet effects on the incorporation of metal adatoms into the crystal. A relevant role is played by the vapor-liquid-solid growth mode that takes place under the droplets due to nitrogen molecules directly impinging on the droplets. The role of droplets in the growth dynamics here observed and modeled in the case of Nitride semiconductors is general and it can be extended to describe the growth of the material class of binary compounds when droplets are present on the surface.