Negative-type photosensitive poly(phenylene ether) based on poly(2,6-dimethyl-1,4-phenylene ether), a crosslinker, and a photoacid generator

• Published in: Journal of polymer science. Part A, Polymer chemistry Vol. 46; no. 15; pp. 4949 - 4958
• Main Authors: Mizoguchi, Katsuhisa, Ueda, Mitsuru
• Format: Journal Article
• Language: English
• Published: Hoboken Wiley Subscription Services, Inc., A Wiley Company 01-08-2008; Wiley
• Subjects: Applied sciences; crosslinker; Crosslinking and degradation; dielectric properties; Exact sciences and technology; low dielectric constant; negative-type; photoacid generator; photoresists; photosensitive polymer; Physicochemistry of polymers; poly(phenylene ether); Polymers and radiations; Photochemical crosslinking; photoacid generator; Refraction index; crosslinker; Negative resist; Diphenols; Sulfonate; negative-type; photoresists; Optical properties; Iodonium compounds; Crosslinked polymer; Water absorption; Photolithography; Permittivity; Photoresist; poly(phenylene ether); Photosensitivity; Dielectric properties; Experimental study; Contrast; Anthracene derivatives; photosensitive polymer; Chemically amplified resist; Phenylene oxide(dimethyl) polymer; low dielectric constant
• ISSN: 0887-624X; 1099-0518
• DOI: 10.1002/pola.22626

A negative-type photosensitive poly(phenylene ether) (PSPPE) based on poly(2,6-dimethyl-1,4-phenylene ether) (PPE), a novel crosslinker 4,4'-methylene-bis [2,6-bis(methoxymethyl)phenol] (MBMP) having good compatibility with PPE, and diphenylidonium 9,10-dimethoxy anthracene-2-sulfonate (DIAS) as a photoacid generator (PAG) has been developed. This resist consisting of PPE (73 wt %), MBMP (20 wt %) and DIAS (7 wt %) showed a high sensitivity (D₀.₅) of 58 mJ/cm² and a contrast (γ₀.₅) of 9.5 when it was exposed to i-line (365 nm wavelength light), postexposure baked at 145 °C for 10 min, and developed with toluene at 25 °C. A fine negative image featuring 6 μm line-and-space pattern was obtained on the film exposed to 300 mJ/cm² of i-line by a contact-printed mode. The resulting polymer film cured at 300 °C for 1 h under nitrogen had a low dielectric constant (ε = 2.46) comparable to that of PPE and a higher Tg than that of PPE. In addition, the cured PSPPE film was pretty low water absorption (<0.05%) as same as PPE.