Silicon nanocrystals: Novel synthesis routes for photovoltaic applications

Novel processes were developed for fabricating silicon nanocrystals and nanocomposite materials which could be used as absorbers in third generation photovoltaic devices. A conventional high‐temperature annealing technique was studied as a reference process, with some new insights in crystallisation...

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Published in:Physica status solidi. A, Applications and materials science Vol. 210; no. 4; pp. 649 - 657
Main Authors: Perraud, Simon, Quesnel, Etienne, Parola, Stéphanie, Barbé, Jérémy, Muffato, Viviane, Faucherand, Pascal, Morin, Christine, Jarolimek, Karol, Van Swaaij, René A. C. M. M., Zeman, Miro, Richards, Stephen, Kingsley, Andrew, Doyle, Hugh, Linehan, Keith, O'Brien, Shane, Povey, Ian M., Pemble, Martyn E., Xie, Ling, Leifer, Klaus, Makasheva, Kremena, Despax, Bernard
Format: Journal Article
Language:English
Published: Berlin WILEY-VCH Verlag 01-04-2013
WILEY‐VCH Verlag
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Summary:Novel processes were developed for fabricating silicon nanocrystals and nanocomposite materials which could be used as absorbers in third generation photovoltaic devices. A conventional high‐temperature annealing technique was studied as a reference process, with some new insights in crystallisation mechanisms. Innovative methods for silicon nanocrystal synthesis at much lower temperature were demonstrated, namely chemical vapour deposition (CVD), physical vapour deposition (PVD) and aerosol‐assisted CVD. Besides the advantage of low substrate temperature, these new techniques allow to fabricate silicon nanocrystals embedded in wide bandgap semiconductor host matrices, with a high density and a narrow size dispersion.
Bibliography:ArticleID:PSSA201200533
EU founded FP7 project 'SNAPSUN' - No. 246310
ark:/67375/WNG-QX6SC5G9-5
istex:68A82C31783868AA7E6EB1E46EE93585F20C11F8
ObjectType-Article-1
SourceType-Scholarly Journals-1
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content type line 23
ISSN:1862-6300
1862-6319
DOI:10.1002/pssa.201200533