Enhancement of Ferroelectric Polarization Stability by Interface Engineering

By using theoretical predictions based on first‐principle calculations, we explore an interface engineering approach to stabilize polarization states in ferroelectric heterostructures with a thickness of just several nanometers.

Saved in:

Bibliographic Details
Published in:	Advanced materials (Weinheim) Vol. 24; no. 9; pp. 1209 - 1216
Main Authors:	Lu, H., Liu, X., Burton, J. D., Bark, C.-W., Wang, Y., Zhang, Y., Kim, D. J., Stamm, A., Lukashev, P., Felker, D. A., Folkman, C. M., Gao, P., Rzchowski, M. S., Pan, X. Q., Eom, C.-B., Tsymbal, E. Y., Gruverman, A.
Format:	Journal Article
Language:	English
Published:	Weinheim WILEY-VCH Verlag 02-03-2012 WILEY‐VCH Verlag
Subjects:	Barium - chemistry Barium Compounds - chemistry Electricity Electronics - instrumentation ferroelectrics heterostructures interface engineering Nanostructures - chemistry Oxides - chemistry Polarization Ruthenium Compounds - chemistry Strontium - chemistry Surface Properties thin films
Online Access:	Get full text
Tags:	Add Tag No Tags, Be the first to tag this record!

Description
Summary:	By using theoretical predictions based on first‐principle calculations, we explore an interface engineering approach to stabilize polarization states in ferroelectric heterostructures with a thickness of just several nanometers.
Bibliography:	ark:/67375/WNG-D5SHF2SC-1 ArticleID:ADMA201104398 istex:F83EA56D40DA5D1CB37EBF642518A60E5BBCD727 ObjectType-Article-1 SourceType-Scholarly Journals-1 ObjectType-Feature-2 content type line 23
ISSN:	0935-9648 1521-4095
DOI:	10.1002/adma.201104398