Reduction of stacking faults in (11$ bar 2 $0) and (11$ bar 2 $2) GaN films by ELO techniques and benefit on GaN wells emission
New conditions for one‐step ELO were implemented to grow coalesced (11$ \bar 2 $0) non‐polar and (11$ \bar 2 $2) semi‐polar GaN layers starting, respectively, from R ‐ and M ‐plane sapphire. A great part of the stacking faults (SFs) and dislocations are filtrated resulting in GaN material with bette...
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Published in: | Physica status solidi. A, Applications and materials science Vol. 204; no. 1; pp. 282 - 289 |
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Main Authors: | , , , , , , , |
Format: | Journal Article Conference Proceeding |
Language: | English |
Published: |
Berlin
WILEY-VCH Verlag
01-01-2007
WILEY‐VCH Verlag Wiley-VCH Wiley |
Subjects: | |
Online Access: | Get full text |
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Summary: | New conditions for one‐step ELO were implemented to grow coalesced (11$ \bar 2 $0) non‐polar and (11$ \bar 2 $2) semi‐polar GaN layers starting, respectively, from R ‐ and M ‐plane sapphire. A great part of the stacking faults (SFs) and dislocations are filtrated resulting in GaN material with better structural and optical properties. In the ELO‐like (11$ \bar 2 $0) and (11$ \bar 2 $2) films, the near band edge emission dominates photoluminescence spectra and is in the range 3.45–3.48 eV depending on lattice deformation. The strongest emission is met for the semi‐polar (11$ \bar 2 $2) ELO. When mask stripes are not normal to the c‐axis, a singular ELO is developed with inclined coalescence facets. However, in this case, SFs overgrow above the mask and so lead to poor optical properties, dominated by SF and dislocation related peaks. In any case, the internal electric field reduction in (Al,Ga)N/GaN non‐ or semi‐polar quantum‐wells stacks is better viewed when the heterostructures are grown on ELO with stripes normal to the c‐axis. (© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim) |
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Bibliography: | European contract "PARSEM" - No. CT2004-005583 ark:/67375/WNG-905BD4PD-1 ArticleID:PSSA200673585 istex:BA373E76F4042D219FD9CFFD84356301D9887301 |
ISSN: | 1862-6300 1862-6319 |
DOI: | 10.1002/pssa.200673585 |