Surface modification of poly(biphenyl dianhydride-para-phenylene diamine) (BPDA-PDA) polyimide by UV photo-oxidation

Poly(biphenyl dianhydride-para-phenylene diamine) (BPDA-PDA, Upilex-S) polyimide (PI), was exposed to 185 and 254 nm UV radiation in the presence of oxygen at atmospheric pressure. SEM micrographs revealed only a small change in surface morphology following treatment. XPS showed an approximate doubl...

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Bibliographic Details
Published in:Journal of adhesion science and technology Vol. 20; no. 4; pp. 319 - 334
Main Authors: Sener, U., Parekh, B., Entenberg, A., Debies, T., Takacs, G. A.
Format: Journal Article
Language:English
Published: Leiden Taylor & Francis Group 01-01-2006
Brill
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Summary:Poly(biphenyl dianhydride-para-phenylene diamine) (BPDA-PDA, Upilex-S) polyimide (PI), was exposed to 185 and 254 nm UV radiation in the presence of oxygen at atmospheric pressure. SEM micrographs revealed only a small change in surface morphology following treatment. XPS showed an approximate doubling of the O/C ratio on the modified surfaces which appeared mostly as the carbonyl moiety. UV photo-oxidation degraded Upilex-S to produce a locus of failure below the interface (cohesive failure). XPS and TOF-SIMS results indicated that the Upilex-S thickness remaining on sputtered Cu after the tape test on the Cu-modified surface was ≤ 10 nm. Cohesive failure occurred at shorter treatment times when Cu was sputter coated on modified BPDA-PDA than on poly(pyromellitic dianhydide-oxydianiline) (PMDA-ODA) PI.
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ISSN:0169-4243
1568-5616
DOI:10.1163/156856106776381776