Metrology of a Focusing Capillary Using Optical Ptychography

The focusing property of an ellipsoidal monocapillary has been characterized using the ptychography method with a 405 nm laser beam. The recovered wavefront gives a 12.5×10.4μm2 focus. The reconstructed phase profile of the focused beam can be used to estimate the height error of the capillary surfa...

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Bibliographic Details
Published in:Sensors (Basel, Switzerland) Vol. 20; no. 22; p. 6462
Main Authors: Huang, Xiaojing, Nazaretski, Evgeny, Xu, Weihe, Hidas, Dean, Cordier, Mark, Stripe, Benjamin, Yun, Wenbing, Chu, Yong S.
Format: Journal Article
Language:English
Published: Basel MDPI AG 12-11-2020
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Summary:The focusing property of an ellipsoidal monocapillary has been characterized using the ptychography method with a 405 nm laser beam. The recovered wavefront gives a 12.5×10.4μm2 focus. The reconstructed phase profile of the focused beam can be used to estimate the height error of the capillary surface. The obtained height error shows a Gaussian distribution with a standard deviation of 1.3 μm. This approach can be used as a quantitative tool for evaluating the inner functional surfaces of reflective optics, complementary to conventional metrology methods.
Bibliography:SourceType-Other Sources-1
content type line 63
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USDOE Office of Science (SC), Basic Energy Sciences (BES)
SC0012704; SC0020620; SC0015196.
BNL-220620-2020-JAAM
ISSN:1424-8220
1424-8220
DOI:10.3390/s20226462