Evaluation of plasma parameters on PEALD deposited TaCN

• Published in: Microelectronic engineering Vol. 107; pp. 156 - 160
• Main Authors: Piallat, Fabien, Beugin, Virginie, Gassilloud, Remy, Michallon, Philippe, Dussault, Laurent, Pelissier, Bernard, Asikainen, Timo, Maes, Jan Willem, Martin, François, Morin, Pierre, Vallée, Christophe
• Format: Journal Article Conference Proceeding
• Language: English
• Published: Amsterdam Elsevier B.V 01-07-2013; Elsevier
• Subjects: Carbo-nitride tantalum (TaCN); Condensed matter: electronic structure, electrical, magnetic, and optical properties; Condensed matter: structure, mechanical and thermal properties; Cross-disciplinary physics: materials science; rheology; Density; Deposition; Diffraction; Electronic structure and electrical properties of surfaces, interfaces, thin films and low-dimensional structures; Electronic transport in multilayers, nanoscale materials and structures; Electronics; Engineering Sciences; Evolution; Exact sciences and technology; Materials science; Nanoscale materials: clusters, nanoparticles, nanotubes, and nanocrystals; Other materials; Physics; Plasma Enhanced Atomic Layer Deposition (PEALD); Reflection; Specific materials; Spectrometry; Structure of solids and liquids; crystallography; Tantalum; TBTDET; X-ray diffraction (XRD); X-ray photoelectron spectroscopy; X-ray reflection (XRR); X-rays; Carbo-nitride tantalum (TaCN); X-ray reflection (XRR); Tantalum; Plasma Enhanced Atomic Layer Deposition (PEALD); X-ray diffraction (XRD); TBTDET; X-ray photoelectron spectroscopy; Atomic layer method; Electrical conductivity; Tantalum nitride; Organometallic compounds; Roughness; X-ray reflection; XRD; Crystallography; Atomic layer epitaxial growth; Thickness; X-ray photoelectron spectra
• ISSN: 0167-9317; 1873-5568
• DOI: 10.1016/j.mee.2012.08.020

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► Tuning TaCN deposited material from TaN-like to TaC-like was possible using plasma. ► Influence of plasma power on TaCN properties is higher than influence of plasma energy. ► Mechanism of TBTDET molecule breaking down by H2 plasma was introduced.
In this article influence of plasma parameters on TaCN deposition using Plasma Enhanced Atomic Layer Deposition (PEALD) is studied. TaCN is deposited on 300mm Si substrate with the organometallic precursor Tertiary-ButylimidoTrisDiEthyl-aminoTantalum (TBTDET) and H2/Ar plasma at different plasma power. Thickness, density, roughness, resistivity, crystallography and composition of the obtained layers were analysed by X-ray Reflection (XRR), 4 points probe measurement, X-ray Diffraction (XRD) and X-ray Photoelectron Spectrometry (XPS) respectively. Results show an evolution of the material with the increase of plasma power from a TaN-like to a TaC-like material.