Fabrication of Si nanoparticles from Si swarf and application to solar cells
Si nanoparticles with diameter of 1-20nm have been fabricated from Si swarf by use of a beads milling method. Treatment with dilute hydrofluoric acid stabilizes Si nanoparticles, and the thickness of the SiO2 layer formed by leaving nanoparticles in air for one week is only 1.2nm. p-Si nanoparticles...
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Published in: | Applied surface science Vol. 312; pp. 39 - 42 |
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Main Authors: | , , , |
Format: | Conference Proceeding Journal Article |
Language: | English |
Published: |
Amsterdam
Elsevier
01-09-2014
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Subjects: | |
Online Access: | Get full text |
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Summary: | Si nanoparticles with diameter of 1-20nm have been fabricated from Si swarf by use of a beads milling method. Treatment with dilute hydrofluoric acid stabilizes Si nanoparticles, and the thickness of the SiO2 layer formed by leaving nanoparticles in air for one week is only 1.2nm. p-Si nanoparticles/crystalline n-Si structure shows rectifying behavior, indicating formation of pn-junction. Treatment with nitric acid followed by heating at 900 degree C greatly decreases series resistance, showing that the ultrathin SiO2 layer formed by nitric acid oxidation melts and is bound to surrounding nanoparticles. p-type Si nanoparticles/n-type crystalline Si structure shows rectifying behavior and the photovoltaic effect, indicating that Si nanoparticles are applicable to solar cells. |
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Bibliography: | ObjectType-Article-1 SourceType-Scholarly Journals-1 ObjectType-Feature-2 content type line 23 |
ISSN: | 0169-4332 1873-5584 |
DOI: | 10.1016/j.apsusc.2014.02.131 |