Fabrication of Si nanoparticles from Si swarf and application to solar cells

Si nanoparticles with diameter of 1-20nm have been fabricated from Si swarf by use of a beads milling method. Treatment with dilute hydrofluoric acid stabilizes Si nanoparticles, and the thickness of the SiO2 layer formed by leaving nanoparticles in air for one week is only 1.2nm. p-Si nanoparticles...

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Bibliographic Details
Published in:Applied surface science Vol. 312; pp. 39 - 42
Main Authors: MAEDA, Masanori, IMAMURA, Kentaro, MATSUMOTO, Taketoshi, KOBAYASHI, Hikaru
Format: Conference Proceeding Journal Article
Language:English
Published: Amsterdam Elsevier 01-09-2014
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Summary:Si nanoparticles with diameter of 1-20nm have been fabricated from Si swarf by use of a beads milling method. Treatment with dilute hydrofluoric acid stabilizes Si nanoparticles, and the thickness of the SiO2 layer formed by leaving nanoparticles in air for one week is only 1.2nm. p-Si nanoparticles/crystalline n-Si structure shows rectifying behavior, indicating formation of pn-junction. Treatment with nitric acid followed by heating at 900 degree C greatly decreases series resistance, showing that the ultrathin SiO2 layer formed by nitric acid oxidation melts and is bound to surrounding nanoparticles. p-type Si nanoparticles/n-type crystalline Si structure shows rectifying behavior and the photovoltaic effect, indicating that Si nanoparticles are applicable to solar cells.
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ISSN:0169-4332
1873-5584
DOI:10.1016/j.apsusc.2014.02.131