Electroreduction of oxygen on gold-supported nanostructured palladium films in acid solutions

The electrochemical reduction of oxygen on thin Pd films with a nominal thickness of 0.25–10 nm on polycrystalline Au substrate (Pd/Au) was studied. The Pd films were prepared by electron beam evaporation and oxygen reduction was studied in 0.1 M HClO 4 and 0.05 M H 2SO 4 solutions using the rotatin...

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Bibliographic Details
Published in:Electrochimica acta Vol. 55; no. 22; pp. 6768 - 6774
Main Authors: Sarapuu, Ave, Kasikov, Aarne, Wong, Naomi, Lucas, Chris A., Sedghi, Gita, Nichols, Richard J., Tammeveski, Kaido
Format: Journal Article
Language:English
Published: Kidlington Elsevier Ltd 01-09-2010
Elsevier
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Summary:The electrochemical reduction of oxygen on thin Pd films with a nominal thickness of 0.25–10 nm on polycrystalline Au substrate (Pd/Au) was studied. The Pd films were prepared by electron beam evaporation and oxygen reduction was studied in 0.1 M HClO 4 and 0.05 M H 2SO 4 solutions using the rotating disk electrode (RDE) method. The surface morphology of Pd overlayers was examined by scanning tunnelling microscopy (STM). O 2 reduction predominantly proceeds through 4e − pathway on all Pd/Au electrodes. The specific activity (SA) of oxygen reduction was lower in H 2SO 4 solution and decreased slightly with decreasing the Pd film thickness. In HClO 4, the SA was higher and not significantly dependent on the film thickness. The Tafel slope values close to −60 mV at low current densities and −120 mV at high current densities were found for all electrodes.
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ISSN:0013-4686
1873-3859
DOI:10.1016/j.electacta.2010.05.092