Charge generation during oxidation of thin Hf metal films on silicon

• Published in: Thin solid films Vol. 513; no. 1; pp. 201 - 205
• Main Authors: Gougousi, Theodosia, Terry, David B., Parsons, Gregory N.
• Format: Journal Article
• Language: English
• Published: Lausanne Elsevier B.V 14-08-2006; Elsevier Science
• Subjects: Charge defects; Cold working, work hardening; annealing, quenching, tempering, recovery, and recrystallization; textures; Condensed matter: electronic structure, electrical, magnetic, and optical properties; Cross-disciplinary physics: materials science; rheology; Dielectric thin films; Dielectrics; Dielectrics, piezoelectrics, and ferroelectrics and their properties; Electronic structure and electrical properties of surfaces, interfaces, thin films and low-dimensional structures; Exact sciences and technology; Hafmium oxide; Interfaces; Materials science; Oxidation; Physics; Treatment of materials and its effects on microstructure and properties; Interfaces; 77.55.+f; Charge defects; 73.61.Ng; Oxidation; Dielectrics; Hafmium oxide; Inorganic compounds; Vacancies; Oxide layer; MOS structure; Experimental study; CV characteristic; Hafmium oxide; Charge defects; Dielectrics; Interfaces; Oxidation; Rapid thermal annealing; Metallic thin films; Transition elements; Size effect; Hafnium; Growth mechanism; Charge carrier generation; Capacitance; X-ray photoelectron spectra; 73.61.Ng; 77.55.+f
• ISSN: 0040-6090; 1879-2731
• DOI: 10.1016/j.tsf.2006.02.004

Oxidation of Hf metal films on Si appears to follow different charge generation rules than the traditional oxidation of Si described in detail by Deal et al. [B.E. Deal, M. Sklar, A.S. Grove, E.H. Snow, J. Electrochem. Soc. 114 (1967) 226]. Oxidation of thin Hf metal films on silicon in oxygen rich environments to form Hf-silicate results in rapid growth of silicon oxide interfacial layers and generation of significant charge concentration in the films. Oxidation of Hf in oxygen-deficient environment leads to improved control of the interface with much thinner interfacial layers and substantial reduction in the charge present in the films. Results from capacitance vs. voltage and X-ray photoelectron spectroscopy measurements are compared to correlate charge with chemical structure evolution during oxidation and dielectric layer formation. It is demonstrated that processing conditions may influence the quality of the Hf dielectric film significantly by generating positive charge that is not intrinsic to the material.