DLR-Jet REMPI - Ultrasensitive Monitor for Process Control in Thermal Processes

• Published in: Chemical engineering & technology Vol. 21; no. 6; pp. 487 - 491
• Main Authors: Oser, Harald, Thanner, Reinhold, Grotheer, Horst-Henning
• Format: Journal Article
• Language: English
• Published: Weinheim WILEY-VCH Verlag 01-06-1998; WILEY‐VCH Verlag; Wiley-VCH
• Subjects: Air pollution caused by fuel industries; Analysis methods; Applied sciences; Atmospheric pollution; Energy; Energy. Thermal use of fuels; Exact sciences and technology; Metering. Control; Pollution; Trace analysis; Mobile unit; Heat treatment; Chemical analysis; Resonance state; Coupled method; Process control; Pollution prevention; Gas analysis; Pollutant emission; Concentration measurement; Incineration; Photoionization; Continuous control; Air pollution; Performance; Multiphoton ionization; Mass spectrometry
• ISSN: 0930-7516; 1521-4125
• DOI: 10.1002/(SICI)1521-4125(199806)21:6<487::AID-CEAT487>3.0.CO;2-Q

Process control requires sensitive and selective on‐line monitors for species concentrations. Current REMPI mass spectrometers are suitable instruments in terms of selectivity and on‐line capability but, generally, their sensitivities are too low. The DLR‐Jet REMPI geometry, by contrast, provides a very high sensitivity without loss in selectivity or on‐line capability. A series of tests and their results show that Jet REMPI can be made an instrument suitable for industrial use.