Scalable growth of vertically oriented graphene nanosheets with high rate by a high-flux mesoplasma chemical vapor deposition

• Published in: Carbon trends Vol. 4; p. 100069
• Main Authors: Wang, Junjie, Zhang, Huan, Zhao, Yunxing, Yao, Lingze, Zhao, Min, Xu, Xiaoliang, Yan, Baojie, Ye, Jichun, Zhao, Yusheng, Wu, Sudong
• Format: Journal Article
• Language: English
• Published: Elsevier Ltd 01-07-2021; Elsevier
• Subjects: High rate; Mesoplasma CVD; Scalable growth; Vertically oriented graphene nanosheets; Vertically oriented graphene nanosheets; High rate; Mesoplasma CVD; Scalable growth
• ISSN: 2667-0569; 2667-0569
• DOI: 10.1016/j.cartre.2021.100069

•A large area growth of vertically oriented graphene nanosheet has been obtained.•The growth rate reaches as high as on the order of ten micrometer per minute.•A continues growth on large area by sweeping the substrate has been predicted.
The Vertically Oriented Graphene Nanosheets (VGNs) possesses many promising properties and attracts intense interests in various applications due to its unique nanoarchitecture and intrinsic properties of graphene. However, a scalable growth of VGNs film with high rate is still an open challenge that hampers both the scientific research and mass applications. Herein, we report for the first time a large area growth of VGNs film with high rate via a high-density and high-flux mesoplasma chemical vapor deposition by rotating the substrate. A uniform VGNs film on a large area with a high growth rate on the order of ten micrometer per minute has been obtained. A continues growth process of VGNs film with high rate is also predicted by sweeping the substrate, which gives a new route for the scalable growth of VGNs film with high rate for the future mass applications.
[Display omitted]