Growth of beta barium borate (β-BaB 2O 4) thin films by injection metal organic chemical vapour deposition

• Published in: Thin solid films Vol. 515; no. 16; pp. 6507 - 6511
• Main Authors: Wersand-Quell, S., Orsal, G., Thévenin, P., Bath, A.
• Format: Journal Article Conference Proceeding
• Language: English
• Published: Lausanne Elsevier B.V 04-06-2007; Elsevier Science; Elsevier
• Subjects: Borates; Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.); Cross-disciplinary physics: materials science; rheology; CVD; Exact sciences and technology; Injection-MOCVD; Materials science; Methods of deposition of films and coatings; film growth and epitaxy; Optics; Physics; Theory and models of film growth; Thin film growth; β-BBO; CVD; Injection-MOCVD; β-BBO; Thin film growth; Borates; Temperature dependence; Barium; Organometallic compounds; Core levels; Raman spectroscopy; MOCVD; Film growth; Thin films; Metallic thin films; Optical microscopy; Growth mechanism; X-ray photoelectron spectra
• ISSN: 0040-6090; 1879-2731
• DOI: 10.1016/j.tsf.2006.11.181

Thin films containing beta barium borate (β-BaB
2O
4 so called β-BBO) were grown on silicon (100) substrates by injection metal organic chemical vapour deposition for different deposition temperatures. The films were characterized by optical microscopy, micro-Raman spectroscopy and X-ray photoelectron Spectroscopy (XPS). The micro-Raman spectra show an intense peak at 637 cm
−
1
that is the fingerprint of β-BBO. Our XPS analysis permits the measurement of the Ba, B and O core levels, which are reported here for the first time for β-BBO thin films. The formation of a new spectral component appearing with lower growth temperatures has been observed as well.