Multilayer graphene films grown by molecular beam deposition
Few-layer graphene films are grown using a Molecular Beam Deposition (MBD) technique in ultra-high vacuum by evaporation of atomic carbon and subsequent annealing of the samples at 800–900 °C. The graded thickness layers are grown on strip-shaped oxidized silicon substrates which are covered with 30...
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Published in: | Solid state communications Vol. 150; no. 17; pp. 809 - 811 |
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Main Authors: | , , , , , , , , , , |
Format: | Journal Article |
Language: | English |
Published: |
Kidlington
Elsevier Ltd
01-05-2010
Elsevier |
Subjects: | |
Online Access: | Get full text |
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Summary: | Few-layer graphene films are grown using a Molecular Beam Deposition (MBD) technique in ultra-high vacuum by evaporation of atomic carbon and subsequent annealing of the samples at 800–900 °C. The graded thickness layers are grown on strip-shaped oxidized silicon substrates which are covered with 300 nm thick nickel films deposited by
e
-beam evaporation. The thickness of the deposited carbon layers changes continuously from ∼70 Å to less than 4 Å. The relatively narrow optical phonon bands in Raman spectroscopy reveal that good quality multilayer graphene films form on the Ni surface. |
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Bibliography: | ObjectType-Article-2 SourceType-Scholarly Journals-1 ObjectType-Feature-1 content type line 23 |
ISSN: | 0038-1098 1879-2766 |
DOI: | 10.1016/j.ssc.2010.02.029 |