Multilayer graphene films grown by molecular beam deposition

Few-layer graphene films are grown using a Molecular Beam Deposition (MBD) technique in ultra-high vacuum by evaporation of atomic carbon and subsequent annealing of the samples at 800–900 °C. The graded thickness layers are grown on strip-shaped oxidized silicon substrates which are covered with 30...

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Bibliographic Details
Published in:Solid state communications Vol. 150; no. 17; pp. 809 - 811
Main Authors: Garcia, Jorge M., He, Rui, Jiang, Mason P., Yan, Jun, Pinczuk, Aron, Zuev, Yuri M., Kim, Keun Soo, Kim, Philip, Baldwin, Kirk, West, Ken W., Pfeiffer, Loren N.
Format: Journal Article
Language:English
Published: Kidlington Elsevier Ltd 01-05-2010
Elsevier
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Summary:Few-layer graphene films are grown using a Molecular Beam Deposition (MBD) technique in ultra-high vacuum by evaporation of atomic carbon and subsequent annealing of the samples at 800–900 °C. The graded thickness layers are grown on strip-shaped oxidized silicon substrates which are covered with 300 nm thick nickel films deposited by e -beam evaporation. The thickness of the deposited carbon layers changes continuously from ∼70 Å to less than 4 Å. The relatively narrow optical phonon bands in Raman spectroscopy reveal that good quality multilayer graphene films form on the Ni surface.
Bibliography:ObjectType-Article-2
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content type line 23
ISSN:0038-1098
1879-2766
DOI:10.1016/j.ssc.2010.02.029