Mechanisms of lateral epitaxial overgrowth of gallium nitride by metalorganic chemical vapor deposition

We investigate the effect of growth temperature (1015–1100°C), growth duration (3–90 min), and pattern geometry on the lateral epitaxial overgrowth (LEO) of GaN stripes using a SiO 2-masked GaN/Al 2O 3 seed. The mask openings (5 and 10 μm) are aligned in the 〈1 1̄ 0 0〉 directions and the fill factor...

Full description

Saved in:
Bibliographic Details
Published in:Journal of crystal growth Vol. 195; no. 1; pp. 328 - 332
Main Authors: Marchand, H., Ibbetson, J.P., Fini, P.T., Keller, S., DenBaars, S.P., Speck, J.S., Mishra, U.K.
Format: Journal Article Conference Proceeding
Language:English
Published: Amsterdam Elsevier B.V 01-12-1998
Elsevier
Subjects:
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:We investigate the effect of growth temperature (1015–1100°C), growth duration (3–90 min), and pattern geometry on the lateral epitaxial overgrowth (LEO) of GaN stripes using a SiO 2-masked GaN/Al 2O 3 seed. The mask openings (5 and 10 μm) are aligned in the 〈1 1̄ 0 0〉 directions and the fill factor (ratio of opening width to pattern period) is varied between 0.01 and 0.5. Vertical {1 1 2̄ 0} sidewalls are observed in conditions of high temperature or high fill factor, whereas inclined {1 1 2̄ n} facets ( n≈1–2.5) are observed in conditions of low temperature or low fill factor. The set of exposed facets is roughly independent of growth duration between 3 and 90 min. We suggest that the observed morphologies result from the bonding structure of the various facets in conjunction with the local variations of the V/III ratio.
ISSN:0022-0248
1873-5002
DOI:10.1016/S0022-0248(98)00591-0