Mechanisms of lateral epitaxial overgrowth of gallium nitride by metalorganic chemical vapor deposition
We investigate the effect of growth temperature (1015–1100°C), growth duration (3–90 min), and pattern geometry on the lateral epitaxial overgrowth (LEO) of GaN stripes using a SiO 2-masked GaN/Al 2O 3 seed. The mask openings (5 and 10 μm) are aligned in the 〈1 1̄ 0 0〉 directions and the fill factor...
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Published in: | Journal of crystal growth Vol. 195; no. 1; pp. 328 - 332 |
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Main Authors: | , , , , , , |
Format: | Journal Article Conference Proceeding |
Language: | English |
Published: |
Amsterdam
Elsevier B.V
01-12-1998
Elsevier |
Subjects: | |
Online Access: | Get full text |
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Summary: | We investigate the effect of growth temperature (1015–1100°C), growth duration (3–90
min), and pattern geometry on the lateral epitaxial overgrowth (LEO) of GaN stripes using a SiO
2-masked GaN/Al
2O
3 seed. The mask openings (5 and 10
μm) are aligned in the 〈1
1̄
0
0〉 directions and the fill factor (ratio of opening width to pattern period) is varied between 0.01 and 0.5. Vertical {1
1
2̄
0} sidewalls are observed in conditions of high temperature or high fill factor, whereas inclined {1
1
2̄
n} facets (
n≈1–2.5) are observed in conditions of low temperature or low fill factor. The set of exposed facets is roughly independent of growth duration between 3 and 90
min. We suggest that the observed morphologies result from the bonding structure of the various facets in conjunction with the local variations of the V/III ratio. |
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ISSN: | 0022-0248 1873-5002 |
DOI: | 10.1016/S0022-0248(98)00591-0 |