Elevated ozone and two modern wheat cultivars: An assessment of dose dependent sensitivity with respect to growth, reproductive and yield parameters
Tropospheric ozone (O 3), throughout the globe, has become a potential risk for agriculture. The present investigation was performed with two cultivars of Indian wheat (Sonalika and HUW 510) against ambient and elevated levels of O 3 by using open top chambers (OTCs). Both the cultivars showed the n...
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Published in: | Environmental and experimental botany Vol. 69; no. 3; pp. 328 - 337 |
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Main Authors: | , |
Format: | Journal Article |
Language: | English |
Published: |
Amsterdam
Elsevier B.V
01-12-2010
Oxford; New York, NY: Elsevier Science Elsevier |
Subjects: | |
Online Access: | Get full text |
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Summary: | Tropospheric ozone (O
3), throughout the globe, has become a potential risk for agriculture. The present investigation was performed with two cultivars of Indian wheat (Sonalika and HUW 510) against ambient and elevated levels of O
3 by using open top chambers (OTCs). Both the cultivars showed the negative impact of O
3 on various growth, reproductive and yield parameters but the response among cultivars was quite distinct. Cultivar HUW 510 showed higher O
3 damage in its vegetative parts (shoot and root height, leaf number, leaf area, etc.) than Sonalika, whereas the response of reproductive structures (pollen viability and viable florets per plant) was
vice versa. Yield response to stress (YRS) analysis revealed that degree of damage in both cultivars was more severe under elevated concentrations of O
3 over ambient. The overall results of the present study showed that in future, O
3 would be a threat for wheat production but differential response among cultivars might help researchers to find out a suitable variety for an area experiencing higher concentration of O
3. |
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Bibliography: | http://dx.doi.org/10.1016/j.envexpbot.2010.04.016 ObjectType-Article-2 SourceType-Scholarly Journals-1 ObjectType-Feature-1 content type line 23 |
ISSN: | 0098-8472 1873-7307 |
DOI: | 10.1016/j.envexpbot.2010.04.016 |