Extended high temperature Al gettering for improvement and homogenization of minority carrier diffusion lengths in multicrystalline Si

Multicrystalline Si for photovoltaic applications is a very inhomogeneous material with localized regions of high dislocation density and large impurity and precipitate concentrations which limit solar cell efficiency by acting as carrier recombination sites. Due to slow dissolution of precipitates...

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Bibliographic Details
Published in:Solar energy materials and solar cells Vol. 70; no. 2; pp. 231 - 238
Main Authors: Joshi, Subhash M, Gösele, Ulrich M, Tan, Teh Y
Format: Journal Article
Language:English
Published: Amsterdam Elsevier B.V 15-12-2001
Elsevier
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Summary:Multicrystalline Si for photovoltaic applications is a very inhomogeneous material with localized regions of high dislocation density and large impurity and precipitate concentrations which limit solar cell efficiency by acting as carrier recombination sites. Due to slow dissolution of precipitates in multicrystalline Si, these regions cannot be improved by conventional P and Al gettering treatments for removal of metal impurities which give good results for single crystal Si. It is shown that an extended high temperature Al gettering treatment can improve minority carrier diffusion lengths in these low quality regions and homogenize the electrical properties of multicrystalline Si wafers.
Bibliography:ObjectType-Article-2
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content type line 23
ISSN:0927-0248
1879-3398
DOI:10.1016/S0927-0248(01)00029-0