Preparation of double layer film of boron and carbon by pulsed laser deposition

• Published in: Applied surface science Vol. 197; pp. 603 - 606
• Main Authors: Suda, Y, Suganuma, Y, Sakai, Y, Suzuki, K, Tsujino, J, Homma, N
• Format: Journal Article
• Language: English
• Published: Elsevier B.V 30-09-2002
• Subjects: Amorphous carbon; Boron; Field emission; Pulsed laser deposition; X-ray photoelectron spectroscopy; Boron; Amorphous carbon; 79.60; 81.15.E; 79.20.D; Pulsed laser deposition; Field emission; 61.43; X-ray photoelectron spectroscopy
• ISSN: 0169-4332; 1873-5584
• DOI: 10.1016/S0169-4332(02)00405-1

Double layer films of boron and carbon were prepared by pulsed laser deposition (PLD) on silicon substrates. The film surface morphology was examined by atomic force microscopy (AFM). The chemical composition of the elements, carbon, boron, silicon and oxygen, and bonding state of carbon atoms as a function of the depth from the film surface were analyzed by X-ray photoelectron spectroscopy (XPS) with argon ion sputtering technique. Carbon atoms bonded to boron (CB) were observed as well as carbon atoms bonded to carbon (CC).