Influence of Space Charge During the Oxidation of Metal Surfaces
In this work we present a model for the surface oxide film growth considering the influence of space charge. The space charge field E sp is assumed proportional to the charge of moving metal ions and electrons in the oxide layer. The surface charge field E ox decreases as the Cabrera and Motts’ oxid...
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Published in: | Oxidation of metals Vol. 90; no. 3-4; pp. 515 - 526 |
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Main Authors: | , , , |
Format: | Journal Article |
Language: | English |
Published: |
New York
Springer US
01-10-2018
Springer Nature B.V |
Subjects: | |
Online Access: | Get full text |
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Summary: | In this work we present a model for the surface oxide film growth considering the influence of space charge. The space charge field
E
sp
is assumed proportional to the charge of moving metal ions and electrons in the oxide layer. The surface charge field
E
ox
decreases as the Cabrera and Motts’ oxide thickness
X
grows to its limit
X
1
(
E
ox
=
V
M
/
X
).
E
ox
remains constant for further growth of the oxide film (
E
ox
=
V
M
/
X
1
). The obtained equation for the growing rate of the oxide film covers two stages. The first stage is characterized by a negligible space charge and is described by the typical inverse logarithmic law. During transition from thin to thick film, the oxidation growth rate is described by a direct logarithmic law which is confirmed by many experiments. At the end of this stage, the drift of metal ions is replaced by their diffusion that leads to parabolic law. |
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ISSN: | 0030-770X 1573-4889 |
DOI: | 10.1007/s11085-018-9843-8 |