Inter-diffusion effects in as-deposited Al/Ni polycrystalline multi-layers
Al/Ni multi‐layers, deposited by magnetron sputtering at room temperature have been studied by complementary techniques; XPS, sputter depth profiling, electron‐induced X‐ray emission spectroscopy (XES) and X‐ray diffraction (XRD). XPS depth profile technique evidenced an atomic diffusion dominated b...
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Published in: | Surface and interface analysis Vol. 40; no. 9; pp. 1318 - 1321 |
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Main Authors: | , , , , , , , , |
Format: | Journal Article |
Language: | English |
Published: |
Chichester, UK
John Wiley & Sons, Ltd
01-09-2008
Wiley Wiley-Blackwell |
Subjects: | |
Online Access: | Get full text |
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Summary: | Al/Ni multi‐layers, deposited by magnetron sputtering at room temperature have been studied by complementary techniques; XPS, sputter depth profiling, electron‐induced X‐ray emission spectroscopy (XES) and X‐ray diffraction (XRD). XPS depth profile technique evidenced an atomic diffusion dominated by Ni atoms. Moreover, the Ni diffusion results in the formation of an amorphous phase with a stoichiometry close to the Al3Ni aluminide. Copyright © 2008 John Wiley & Sons, Ltd. |
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Bibliography: | Region Bretagne istex:2567CA9E9B2E3E26FE51649F96E3C7767E905EEE ArticleID:SIA2896 ark:/67375/WNG-VGD6NN9F-7 ObjectType-Article-2 SourceType-Scholarly Journals-1 ObjectType-Feature-1 content type line 23 |
ISSN: | 0142-2421 1096-9918 |
DOI: | 10.1002/sia.2896 |