Inter-diffusion effects in as-deposited Al/Ni polycrystalline multi-layers

Al/Ni multi‐layers, deposited by magnetron sputtering at room temperature have been studied by complementary techniques; XPS, sputter depth profiling, electron‐induced X‐ray emission spectroscopy (XES) and X‐ray diffraction (XRD). XPS depth profile technique evidenced an atomic diffusion dominated b...

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Bibliographic Details
Published in:Surface and interface analysis Vol. 40; no. 9; pp. 1318 - 1321
Main Authors: Salou, M., Rioual, S., Ben Youssef, J., Dekadjevi, D. T., Pogossian, S. P., Jonnard, P., Le Guen, K., Gamblin, G., Rouvellou, B.
Format: Journal Article
Language:English
Published: Chichester, UK John Wiley & Sons, Ltd 01-09-2008
Wiley
Wiley-Blackwell
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Summary:Al/Ni multi‐layers, deposited by magnetron sputtering at room temperature have been studied by complementary techniques; XPS, sputter depth profiling, electron‐induced X‐ray emission spectroscopy (XES) and X‐ray diffraction (XRD). XPS depth profile technique evidenced an atomic diffusion dominated by Ni atoms. Moreover, the Ni diffusion results in the formation of an amorphous phase with a stoichiometry close to the Al3Ni aluminide. Copyright © 2008 John Wiley & Sons, Ltd.
Bibliography:Region Bretagne
istex:2567CA9E9B2E3E26FE51649F96E3C7767E905EEE
ArticleID:SIA2896
ark:/67375/WNG-VGD6NN9F-7
ObjectType-Article-2
SourceType-Scholarly Journals-1
ObjectType-Feature-1
content type line 23
ISSN:0142-2421
1096-9918
DOI:10.1002/sia.2896