Control of the degree of surface graphitization on 3C-SiC(100)/Si(100)

The current method of growing graphene by thermal decomposition of 3C-SiC(100) on silicon substrates is technologically attractive. Here, we investigate the evolution of the surface graphitization as a function of the synthesis temperature. We establish that the carbon enrichment of the surface is c...

Full description

Saved in:
Bibliographic Details
Published in:Surface science Vol. 606; no. 3-4; pp. 217 - 220
Main Authors: Gogneau, N., Balan, A., Ridene, M., Shukla, A., Ouerghi, A.
Format: Journal Article
Language:English
Published: Kidlington Elsevier B.V 01-02-2012
Elsevier
Subjects:
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:The current method of growing graphene by thermal decomposition of 3C-SiC(100) on silicon substrates is technologically attractive. Here, we investigate the evolution of the surface graphitization as a function of the synthesis temperature. We establish that the carbon enrichment of the surface is characterized by a clear modulation of the surface potential and structuration. The structural properties analysis of the graphene layers by low energy electron diffraction and micro-Raman spectroscopy demonstrate a graphitization of the surface. ► We study the growth of graphene by thermal decomposition of 3C-SiC/Si(100) surfaces. ► We analyse the surface graphitization as a function of the synthesis temperature. ► The carbon enrichment of the surface is characterized by a specific structuration. ► The graphitization induces a clear modulation of the surface potential.
Bibliography:ObjectType-Article-2
SourceType-Scholarly Journals-1
ObjectType-Feature-1
content type line 23
ISSN:0039-6028
1879-2758
DOI:10.1016/j.susc.2011.09.021