Dial-a-size: Precision quantum dot nanopatterning using cheap, off-the-shelf copolymers

• Published in: Journal of applied polymer science Vol. 110; no. 6; pp. 3785 - 3794
• Main Authors: McCarthy, W, Ciszek, P, Zeghbroeck, B. Van, Borsa, T, Powers, R
• Format: Journal Article
• Language: English
• Published: Hoboken Wiley Subscription Services, Inc., A Wiley Company 15-12-2008; Wiley
• Subjects: Applied sciences; diblock copolymers; Exact sciences and technology; Forms of application and semi-finished materials; lithography; Miscellaneous; nanotechnology; Polymer industry, paints, wood; polystyrene; self-organization; Technology of polymers; Patterning; Quantum dot; self-organization; Property composition relationship; polystyrene; diblock copolymers; lithography; Experimental study; Methyl methacrylate copolymer; Nanolithography; Dissolution; Modeling; Pore size; Self organization; Diblock copolymer; nanotechnology; Styrene copolymer
• ISSN: 0021-8995; 1097-4628
• DOI: 10.1002/app.27268

In the use of block copolymers as templates for nanolithography, deposition, or etching, substantial time and cost savings can be achieved through the use of algebraic models for block copolymer feature size as a function of both the polymer's molecular weight and the relative concentration of a homopolymer additive. Desired average pore diameters and spacing can be achieved on the first try, using off-the-shelf polymers in a wide range of molecular weights. This allows precise nanoscopic components such as quantum dots to be patterned over large areas rapidly, repeatably, and at very low cost.