Toward Enhanced Humidity Stability of Triboelectric Mechanical Sensors via Atomic Layer Deposition
Humid conditions can disrupt the triboelectric signal generation and reduce the accuracy of triboelectric mechanical sensors. This study demonstrates a novel design approach using atomic layer deposition (ALD) to enhance the humidity resistance of triboelectric mechanical sensors. Titanium oxide (Ti...
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Published in: | Nanomaterials (Basel, Switzerland) Vol. 11; no. 7; p. 1795 |
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Main Authors: | , , , , |
Format: | Journal Article |
Language: | English |
Published: |
Basel
MDPI AG
09-07-2021
MDPI |
Subjects: | |
Online Access: | Get full text |
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Summary: | Humid conditions can disrupt the triboelectric signal generation and reduce the accuracy of triboelectric mechanical sensors. This study demonstrates a novel design approach using atomic layer deposition (ALD) to enhance the humidity resistance of triboelectric mechanical sensors. Titanium oxide (TiOx) was deposited on polytetrafluoroethylene (PTFE) film as a moisture passivation layer. To determine the effective ALD process cycle, the TiOx layer was deposited with 100 to 2000 process cycles. The triboelectric behavior and surface chemical bonding states were analyzed before and after moisture exposure. The ALD-TiOx-deposited PTFE showed three times greater humidity stability than pristine PTFE film. Based on the characterization of TiOx on PTFE film, the passivation mechanism was proposed, and it was related to the role of the oxygen-deficient sites in the TiOx layer. This study could provide a novel way to design stable triboelectric mechanical sensors in highly humid environments. |
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Bibliography: | ObjectType-Article-1 SourceType-Scholarly Journals-1 ObjectType-Feature-2 content type line 23 These authors equally contributed to this work. |
ISSN: | 2079-4991 2079-4991 |
DOI: | 10.3390/nano11071795 |