Tungsten doping effect on V2O5 thin film electrochromic performance

• Published in: Electrochimica acta Vol. 321; p. 134743
• Main Authors: Panagopoulou, Marianthi, Vernardou, Dimitra, Koudoumas, Emmanuel, Tsoukalas, Dimitris, Raptis, Yannis S.
• Format: Journal Article
• Language: English
• Published: Oxford Elsevier Ltd 20-10-2019; Elsevier BV
• Subjects: Amorphization; Band gap widening; Coloration efficiency; Doping; Electrochromic properties; Electrochromism; Glass substrates; Magnetic properties; Magnetron sputtering; Optical properties; Thin films; Tungsten doping; Tungsten oxides; Vanadium pentoxide; Band gap widening; Tungsten doping; Vanadium pentoxide; Electrochromic properties; Coloration efficiency
• ISSN: 0013-4686; 1873-3859
• DOI: 10.1016/j.electacta.2019.134743

Electrochromic W-doped V2O5 thin films have been deposited on FTO-coated glass substrates by RF magnetron sputtering. The structural, morphological, optical and electrochromic properties of films deposited with various tungsten concentrations were studied. The increase of the doping content induces an amorphization of the films, which contributes to an enhanced cycling performance. High W doping (resulting in WO3) values exhibit high coloration efficiency of ∼ 41 cm2 C−1at 560 nm and large transmittance modulation of 76.9% at 560 nm. Both WO3 and V2O5 are electrochromic materials with very good properties, hence their combination is of interest from both technological and fundamental perspectives.