Effect of substrate temperatures on the electrical resistivity of thermally evaporated Mn thin films

Resistivity measurements have been performed on three samples of Mn thin films from 300 to 1.4 K using the van der Pauw four probe technique. The films were grown by thermal evaporation onto glass substrates held at 523, 323 and 77 K, respectively in a bell jar held at 6 × 10 −6 Torr. The resistivit...

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Bibliographic Details
Published in:Cryogenics (Guildford) Vol. 47; no. 3; pp. 153 - 157
Main Authors: Boakye, F., Ampong, F.K., Abavare, E.K.K.
Format: Journal Article
Language:English
Published: Oxford Elsevier Ltd 01-03-2007
Elsevier
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Summary:Resistivity measurements have been performed on three samples of Mn thin films from 300 to 1.4 K using the van der Pauw four probe technique. The films were grown by thermal evaporation onto glass substrates held at 523, 323 and 77 K, respectively in a bell jar held at 6 × 10 −6 Torr. The resistivity–temperature results of the three specimens reveal a variety of low temperature behaviours. A behaviour typical of the bulk α-Mn is obtained with the film grown at a substrate temperature of 523 K whilst with the film grown at a substrate temperature of 323 K, the resistivity tends to a saturation at low temperatures exhibiting a behaviour reminiscent of Kondo scattering. The resistivity–temperature behaviour of the sample held at a substrate temperature of 77 K may be regarded as typical of a metallic alloy glass with a negative temperature coefficient of resistivity at high temperatures and this turns to a T 2 dependence of resistivity at very low temperatures.
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content type line 23
ISSN:0011-2275
1879-2235
DOI:10.1016/j.cryogenics.2006.11.001