Effect of substrate temperatures on the electrical resistivity of thermally evaporated Mn thin films
Resistivity measurements have been performed on three samples of Mn thin films from 300 to 1.4 K using the van der Pauw four probe technique. The films were grown by thermal evaporation onto glass substrates held at 523, 323 and 77 K, respectively in a bell jar held at 6 × 10 −6 Torr. The resistivit...
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Published in: | Cryogenics (Guildford) Vol. 47; no. 3; pp. 153 - 157 |
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Main Authors: | , , |
Format: | Journal Article |
Language: | English |
Published: |
Oxford
Elsevier Ltd
01-03-2007
Elsevier |
Subjects: | |
Online Access: | Get full text |
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Summary: | Resistivity measurements have been performed on three samples of Mn thin films from 300 to 1.4
K using the van der Pauw four probe technique. The films were grown by thermal evaporation onto glass substrates held at 523, 323 and 77
K, respectively in a bell jar held at 6
×
10
−6
Torr. The resistivity–temperature results of the three specimens reveal a variety of low temperature behaviours. A behaviour typical of the bulk α-Mn is obtained with the film grown at a substrate temperature of 523
K whilst with the film grown at a substrate temperature of 323
K, the resistivity tends to a saturation at low temperatures exhibiting a behaviour reminiscent of Kondo scattering. The resistivity–temperature behaviour of the sample held at a substrate temperature of 77
K may be regarded as typical of a metallic alloy glass with a negative temperature coefficient of resistivity at high temperatures and this turns to a
T
2 dependence of resistivity at very low temperatures. |
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Bibliography: | ObjectType-Article-2 SourceType-Scholarly Journals-1 ObjectType-Feature-1 content type line 23 |
ISSN: | 0011-2275 1879-2235 |
DOI: | 10.1016/j.cryogenics.2006.11.001 |