A W-band power detector RFIC design in 0.13 μm SiGe BiCMOS process

ABSTRACT This article presents the results of a wideband power detector radio frequency integrated circuit design intended for W‐band passive imaging sensors. The power detector was fabricated in a 0.13 µm SiGe BiCMOS process technology with 300 GHz/500 GHz fT/fmax. The experimental results show bro...

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Bibliographic Details
Published in:Microwave and optical technology letters Vol. 57; no. 2; pp. 414 - 417
Main Authors: Jonsson, Rolf, Reyaz, Shakila Bint, Malmqvist, Robert, Kaynak, Mehmet
Format: Journal Article
Language:English
Published: Blackwell Publishing Ltd 01-02-2015
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Summary:ABSTRACT This article presents the results of a wideband power detector radio frequency integrated circuit design intended for W‐band passive imaging sensors. The power detector was fabricated in a 0.13 µm SiGe BiCMOS process technology with 300 GHz/500 GHz fT/fmax. The experimental results show broadband RF properties such as a responsivity of 40–60 kV/W and a noise equivalent power (NEP) of 0.3–0.4 pW/Hz1/2 at 70–95 GHz, respectively (the DC power consumption is 225 µW). To the authors' best knowledge, the SiGe detector design reports the widest s11 −10 dB bandwidth (s11 ≤ −10 dB at 79–102 GHz) among silicon based W‐band power detectors and is competitive with InP‐based W‐band detectors in terms of a higher responsivity and similar NEP. © 2015 Wiley Periodicals, Inc. Microwave Opt Technol Lett 57:414–417, 2015
Bibliography:NANOTEC - No. 288531
istex:840A09573A7DEB391A96C346B6AC4ECFF47FF67A
ark:/67375/WNG-R6SZKMFQ-9
ArticleID:MOP28861
ObjectType-Article-1
SourceType-Scholarly Journals-1
ObjectType-Feature-2
content type line 23
ISSN:0895-2477
1098-2760
1098-2760
DOI:10.1002/mop.28861